Investigation of Preparation Conditions and Microstructure of Mn-N Films by Reactive Sputtering-Reference-Cited by-同舟云学术

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Investigation of Preparation Conditions and Microstructure of Mn-N Films by Reactive Sputtering

Published:2008 Issue: Volume:6 Page:115-118
ISSN:1348-0391
Container-title:e-Journal of Surface Science and Nanotechnology
language:en
Short-container-title:e-J. Surf. Sci. Nanotechnol.

Author:

Chiba Masafumi¹,Shinya Naito¹

Affiliation:

1. Department of Materials Chemistry, School of High Technology for Human Welfare, Tokai University, Japan

Publisher

Surface Science Society Japan

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics,Bioengineering,Biotechnology

Link

http://www.jstage.jst.go.jp/article/ejssnt/6/0/6_0_115/_pdf

Reference12 articles.

1. [1] M. Chiba, K. Morio, and Y. Koizumi, J. Magn. Magn. Mater. 242-245, 949 (2002).

2. Electronic Density of State of Mn-N Thin Films Measured by XPS

3. Surface Electronic Structure of Si (111)-(7×7) Resolved in Real Space

4. Strong influence of Ga/N flux ratio on Mn incorporation into Ga1−xMnxN epilayers grown by plasma-assisted molecular beam epitaxy

5. [5] K. Sato and H. Katayama-Yoshida, Jpn. J. Appl. Phys. 40, L485 (2001).

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Induced ferromagnetism in Mn3N2 phase embedded in Mn/Si3N4 multilayers;Journal of Applied Physics;2009-08-15

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