Discharge Instability at Patterned Conductive Layers on Insulating Substrates during Pulsed-Plasma Chemical Vapor Deposition under Near Atmospheric Pressures-Reference-Cited by-同舟云学术

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Discharge Instability at Patterned Conductive Layers on Insulating Substrates during Pulsed-Plasma Chemical Vapor Deposition under Near Atmospheric Pressures

Published:2013 Issue:0 Volume:11 Page:47-52
ISSN:1348-0391
Container-title:e-Journal of Surface Science and Nanotechnology
language:en
Short-container-title:e-J. Surf. Sci. Nanotechnol.

Author:

Inayoshi Yohei¹,Fukidome Hirokazu¹,Nakajima Setsuo²,Uehara Tsuyoshi²,Toyoshima Yasutake³,Suemitsu Maki¹

Affiliation:

1. Research Institute of Electrical Communication, Tohoku University, Japan

2. Sekisui Chemical CO., LTD., Japan

3. Energy Technology Research Institute, National Institute of Advanced Industrial Science and Technology, Japan

Publisher

Surface Science Society Japan

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics,Bioengineering,Biotechnology

Link

https://www.jstage.jst.go.jp/article/ejssnt/11/0/11_47/_pdf

Reference7 articles.

1. [1] Y. Mori, K. Yoshi, H. Kakiuchi, and K. Yasutake, Rev. Sci. Instrum. 71, 3173 (2000).

2. [2] S. Kanazawa, M. Kogoma, T. Moriwaki, and S. Okazaki, J. Phys. D Appl. Phys. 21, 838 (1988).

3. [3] M. Yuasa, Nikkei Microdevices 4, 140 (2001) (in Japanese).

4. [4] H. Kitabatake, M. Suemitsu, H. Kitahata, S. Nakajima, T. Uehara, and Y. Toyoshima, Jpn. J. Appl. Phys. 44, L683 (2005).

5. [5] M. Matsumoto, Y. Inayoshi, M. Suemitsu, E. Miyamoto, T. Yara, S. Nakajima, T. Uehara, and Y. Toyoshima, Appl. Surf. Sci. 254, 6208 (2008).

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