Atomic Diffusion Bonding : Room Temperature Bonding of Glass Substrates Using Metal, Oxide and Nitride Thin Films-Reference-Cited by-同舟云学术

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Atomic Diffusion Bonding : Room Temperature Bonding of Glass Substrates Using Metal, Oxide and Nitride Thin Films

Published:2022-10-10 Issue:10 Volume:65 Page:454-459
ISSN:2433-5835
Container-title:Vacuum and Surface Science
language:en
Short-container-title:Vac. Surf. Sci.

Author:

SHIMATSU Takehito¹,UOMOTO Miyuki¹

Affiliation:

1. Frontier Research Institute for Interdisciplinary Sciences (FRIS), Tohoku University

Publisher

Surface Science Society Japan

Subject

General Medicine

Link

https://www.jstage.jst.go.jp/article/vss/65/10/65_20180937/_pdf

Reference34 articles.

1. 1) T. Shimatsu and M. Uomoto : J. Vac. Sci. Technol., B 28, 706 (2010).

2. 2) T. Shimatsu and M. Uomoto : ECS Trans. 33(4), 61 (2010).

3. 3) T. Shimatsu and M. Uomoto : ECS Trans. 64(5), 317 (2014).

4. 4) T. Suga, K. Miyazawa and Y. Yamagata : MRS Int. Meet. Adv. Mater. 8, 257 (1989).

5. 5) T. Suga, Y. Takahashi, H. Takagi, B. Gibbesch and G. Elssner : Acta Metall. Mater. 40, S133 (1992).

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