InGaAs MOS Gate Stack Formation and the MOS Interface Properties-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

InGaAs MOS Gate Stack Formation and the MOS Interface Properties

Published:2012 Issue:11 Volume:33 Page:628-633
ISSN:0388-5321
Container-title:Hyomen Kagaku
language:en
Short-container-title:Journal of The Surface Science Society of Japan

Author:

TAKAGI Shinichi¹,TAOKA Noriyuki²¹,SUZUKI Rena¹,YOKOYAMA Masafumi¹,KIM Sang-Hyeon¹,TAKENAKA Mitsuru¹

Affiliation:

1. The University of Tokyo

2. Nagoya University

Publisher

Surface Science Society Japan

Subject

General Earth and Planetary Sciences,General Engineering,General Environmental Science

Reference34 articles.

1. 3) International Technology Roadmap for Semiconductors (ITRS) 2011 Edition, http://www.itrs.net/Links/2011ITRS/Home2011.htm

2. 4) S. Takagi, T. Irisawa, T. Tezuka, T. Numata, S. Nakaharai, N. Hirashita, Y. Moriyama, K. Usuda, E. Toyoda, S. Dissanayake, M. Shichijo, R. Nakane, S. Sugahara, M. Takenaka and N. Sugiyama: IEEE Trans. Electron Devices 55, 21 (2008).

3. 7) P.D. Ye, G.D. Wilk, B. Yang, J. Kwo, S.N.G. Chu, S. Nakahara, H.-J.L. Gossmann, J.P. Mannaerts, M. Hong, K.K. Ng and J. Bude: Appl. Phys. Lett. 83, 180 (2003).

4. 8) M.L. Huang, Y.C. Chang, C.H. Chang, Y.J. Lee, P. Chang, J. Kwo, T.B. Wu and M. Hong: Appl. Phys. Lett. 87, 252104 (2005).

5. 9) Y. Xuan, H.C. Lin, P.D. Ye and G.D. Wilk: Appl. Phys. Lett. 88, 263518 (2006).

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP