Design of low-temperature thermal chemical vapor deposition processes
-
Published:1990-11
Issue:6
Volume:34
Page:795-805
-
ISSN:0018-8646
-
Container-title:IBM Journal of Research and Development
-
language:
-
Short-container-title:IBM J. Res. & Dev.
Subject
General Computer Science
Cited by
19 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Pyrolytic Hydrocarbon Growth from Cyclopentadiene;The Journal of Physical Chemistry A;2010-11-05
2. Deposition Technologies of Materials for Cu-Interconnects;Copper Interconnect Technology;2009
3. Current Trends in Patterning with Copper;Chemical Reviews;2002-04-18
4. Thermal Reaction of Trimethylphosphine and Triethylphosphine on Cu(110);The Journal of Physical Chemistry B;2002-01-29
5. Ferroelectrics;Kirk-Othmer Encyclopedia of Chemical Technology;2000-12-04