Metrology in Mask Manufacturing
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Published:1982-09
Issue:5
Volume:26
Page:553-560
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ISSN:0018-8646
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Container-title:IBM Journal of Research and Development
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language:
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Short-container-title:IBM J. Res. & Dev.
Subject
General Computer Science
Cited by
4 articles.
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1. Process Controls;Semiconductor Lithography;1988
2. Optical Exposure;Semiconductor Lithography;1988
3. Towards high volume 1 μm lithography;Precision Engineering;1983-10
4. Semiconductor Manufacturing Technology at IBM;IBM Journal of Research and Development;1982-09