A Tenfold Reduction in Interface Thermal Resistance for Heat Sink Mounting

Author:

Van Heerden D.1,Rude T.R.1,Newson J.1,He J.1,Besnoin E.1,Knio O.M.1,Weihs T.P.1

Affiliation:

1. Reactive NanoTechnologies, 111 lake Front Drive, Hunt Valley, MD 21030, Email:tweihs@rntfoil.com

Abstract

Reactive NanoTechnologies (RNT) has developed a new platform joining technology that can form a metallic bond between a chip package and a heat sink and thereby offer a thermal interface resistance that is up to ten times lower than current thermal interface materials (TIM). The joining process is based on the use of reactive multilayer foils as local heat sources. The foils are a new class of nano-engineered materials, in which self-propagating exothermic reactions can be initiated at room temperature with a hot filament or laser. By inserting a multilayer foil between two solder layers and a chip package and heat sink, energy generated by a chemical reaction in the foil heats the solder to melting and consequently bonds the components. The joining process can be completed in air, argon or vacuum in approximately one second. The resulting metallic joints exhibit thermal resistances up to an order of magnitude lower, than current commercial TIMs. We also demonstrate, using numerical modeling, that the thermal exposure of microelectronic packages during joining is very limited. Finally we show numerically that reactive joining can be used to solder Si dies directly to heat sinks without thermally damaging the chip.

Publisher

IMAPS - International Microelectronics Assembly and Packaging Society

Subject

Electrical and Electronic Engineering,Computer Networks and Communications,Electronic, Optical and Magnetic Materials

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3