Influence of bath temperature and deposition time on hardness and magnetisation of electrodeposited Nickel Manganese Tungsten thin films

Abstract

The Nickel Manganese Tungsten (Ni-Mn-W) thin films were prepared at different temperature and time of deposition on copper substrate. The crystal structure and morphology of deposits were analysed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The XRD revealed that the structure of Ni-Mn-W thin films with have an average grain size of about 28 nm for 45o C. The elemental analysis of Ni-Mn-W thin films were obtained by energy dispersive X-ray spectroscopy (EDAX). The magnetic properties of electrodeposited Ni-Mn-W thin films were obtained by vibrating sample magnetometer (VSM). The magnetic parameters of Ni-Mn-W films such as coercivity and saturation magnetization were decreased with increasing of grain size. The hardness of the films was studies by Vicker Hardness tester through diamond intender method.