Composition and Structure of Czochralski Silicon Implanted with H2+and Annealed under Enhanced Hydrostatic Pressure-Reference-Cited by-同舟云学术

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Composition and Structure of Czochralski Silicon Implanted with H2+and Annealed under Enhanced Hydrostatic Pressure

Published:2010-02 Issue:2 Volume:117 Page:332-335
ISSN:0587-4246
Container-title:Acta Physica Polonica A
language:en
Short-container-title:Acta Phys. Pol. A

Author:

Kulik M.¹,Kobzev A.P.²,Misiuk A.³,Wierzchowski W.⁴,Wieteska K.⁵,Bak-Misiuk J.⁶

Affiliation:

1. Institute of Physics, Maria Curie-Skłodowska University, pl. Marii Curie-Skłodowskiej 1, 20-031 Lublin, Poland

2. Joint Institute for Nuclear Research JINR, Joliot-Curie 6 st., 141980 Dubna, Moscow Region, Russia

3. Institute of Electron Technology, al. Lotników 32/46, 02-668 Warsaw, Poland

4. Institute of Electronic Materials Technology, 01-919 Warsaw, Poland

5. Institute of Atomic Energy, 05-400 Otwock-Świerk, Poland

6. Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland

Publisher

Institute of Physics, Polish Academy of Sciences

Subject

General Physics and Astronomy

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Molecular dynamics of 4-cyano-3-fluorophenyl 4-butylbenzoate (4CFPB) glass-forming liquid crystal in unidirectional silicon nanopores;Liquid Crystals;2014-03-26

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