Revealing the Defects Introduced in N- or Ge-doped Cz-Si by γIrradiation and High Temperature-High Pressure Treatment

Author:

Wieteska K.1,Misiuk A.2,Prujszczyk M.2,Wierzchowski W.3,Surma B.3,Bąk-Misiuk J.4,Romanowski P.4,Shalimov A.4,Capan I.5,Yang D.6,Graeff W.7

Affiliation:

1. Institute of Atomic Energy, 05-400 Otwock,Świerk, Poland

2. Institute of Electron Technology, al. Lotników 32/46, 02-668 Warsaw, Poland

3. Institute of Electronic Materials Technology, Wólczyńska 133, 01-919 Warsaw, Poland

4. Institute of Physics, PAS, al. Lotników 32/46, 02-668 Warsaw, Poland

5. Materials Physics, Rudjer Boskovic Institute, 10000 Zagreb, Croatia

6. State Key Laboratory of Silicon Materials, Zhenjiang University, Hangzhou 310027, China

7. HASYLAB at DESY, Notkestr. 85, 22603 Hamburg, Germany

Publisher

Institute of Physics, Polish Academy of Sciences

Subject

General Physics and Astronomy

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