Pulsed Laser Deposition of Amorphous Co-Fe-Ni-Si-B Thin Films-Reference-Cited by-同舟云学术

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Pulsed Laser Deposition of Amorphous Co-Fe-Ni-Si-B Thin Films

Published:1997-02 Issue:2 Volume:91 Page:321-324
ISSN:0587-4246
Container-title:Acta Physica Polonica A
language:en
Short-container-title:Acta Phys. Pol. A

Author:

Gareev R.R.¹,Alimpiev S.S.¹,Bugoslavskii Yu.V.¹,Nikiforov S.M.¹,Maslov A.I.²,Shubnii G.Yu.³,Zherichin A.N.³

Affiliation:

1. General Physics Institute, Russian Academy of Sciences, Vavilov St. 38, 117942 Moscow, Russia

2. Scientific Research Institute for TV and Radio Broadcasting, Moscow, Russia

3. Technological Lasers Center, Shatura, Moscow district, Russia

Publisher

Institute of Physics, Polish Academy of Sciences

Subject

General Physics and Astronomy

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of Thickness on Magnetic Properties of Fe36Co36B19.2Si4.8Mo2W2Thin Film Prepared by Thermionic Vacuum Arc;Acta Physica Polonica A;2012-01

2. Magnetic properties and thermal stability of CoFeNi-based amorphous films;Journal of Materials Science;2004-06

3. Comparative study of the crystallization behavior of Fe-Cr-B-Si in bulk and thin film forms;Journal of Materials Synthesis and Processing;2001

4. Unique Features of the Crystallization Kinetics of FeCrBSi Thin Films Obtained by Laser Ablation Deposition;MRS Proceedings;2000

5. Pulsed laser deposition of thin films;SPIE Proceedings;1999-05-07

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