Low Temperature Deposition of High Performance Lead Strontium Titanate Thin Films by in situ RF Magnetron Sputtering-Reference-Cited by-同舟云学术

Low Temperature Deposition of High Performance Lead Strontium Titanate Thin Films by in situ RF Magnetron Sputtering

Published:2013-04-22 Issue:6 Volume:96 Page:1682-1684
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:J. Am. Ceram. Soc.

Author:

Li Kui¹,Dong Xianlin¹,Rémiens Denis²,Lei Xiuyun¹,Li Tao¹,Du Gang¹,Wang Genshui¹

Affiliation:

1. Key Laboratory of Inorganic Functional Materials and Devices; Shanghai Institute of Ceramics; Chinese Academy of Sciences; 1295 Dingxi Road Shanghai 200050 China

2. Institute of Electronics; Microelectronics and Nanotechnology (IEMN) - DOAE, UMR CNRS 8520; Université des Sciences et Technologies de Lille 59652 Villeneuve-d'Ascq Cedex France

Funder

National Natural Science Foundation of China

Advance Research Project of Chinese Academy of Sciences

Shanghai Basic Research Project

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1111/jace.12198/fullpdf

Reference18 articles.

1. (Pb,Sr)TiO3 Thin Films for a ULSI DRAM Capacitor Prepared by Liquid Source Misted Chemical Deposition;Chung;Chem. Mater.,2001