A NEW APPROACH TO THE OBSERVATION OF THE RESIST IN X-RAY CONTACT MICROSCOPY-Reference-Cited by-同舟云学术

A NEW APPROACH TO THE OBSERVATION OF THE RESIST IN X-RAY CONTACT MICROSCOPY

Published:1986-09 Issue:3 Volume:44 Page:401-403
ISSN:0031-8655
Container-title:Photochemistry and Photobiology
language:en
Short-container-title:Photochem Photobiol

Author:

Shinohara Kunio,Aoki Sadao,Yanagihara Mihiro,Yagishita Akira,Iguchi Yasuo,Tanaka Akira

Publisher

Wiley

Subject

Physical and Theoretical Chemistry,General Medicine,Biochemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1751-1097.1986.tb04683.x/fullpdf

Reference10 articles.

1. S. Aoki, K. Shinohara, A. Tanaka, Y. Iguchi, and M. Yanagihara (1984 ) Recording X-ray holograms with X-ray resists . InPhoton Factory Activity Report 1983/84, p. VI-108 . National Laboratory for High Energy Physics, Japan.

2. Specimen replication for electron microscopy using x rays and x‐ray resist

3. Improved Detail in Biological Soft X-ray Microscopy: Study of Blood Platelets

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