Comparative study of the electrical characteristics of ALD‐ZnO thin films using H 2 O and H 2 O 2 as the oxidants-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Comparative study of the electrical characteristics of ALD‐ZnO thin films using H 2 O and H 2 O 2 as the oxidants

Published:2019-04-03 Issue:10 Volume:102 Page:5881-5889
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:J Am Ceram Soc

Author:

Lee Woo‐Jae¹²,Bera Susanta¹²,Wan Zhixin²³,Dai Wei³⁴,Bae Jong‐Seong⁵,Hong Tae Eun⁵,Kim Kwang‐Ho¹²,Ahn Ji‐Hoon⁶,Kwon Se‐Hun¹²^ORCID

Affiliation:

1. School of Materials Science and Engineering Pusan National University Busan Republic of Korea

2. Global Frontier R&D Center for Hybrid Interface Materials Pusan National University Busan Republic of Korea

3. Institute of Materials Technology Pusan National University Busan Republic of Korea

4. School of Electromechanical Engineering Guangdong University of Technology Guangzhou PR China

5. Division of High Technology Materials Research, Busan Center Korea Basic Science Institute Busan Republic of Korea

6. Department of Electronic Material Engineering Korea Maritime and Ocean University Busan Republic of Korea

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1111/jace.16429

Reference22 articles.

1. ZnO Devices and Applications: A Review of Current Status and Future Prospects

2. Fundamentals of zinc oxide as a semiconductor

3. Studies on optical, structural and electrical properties of atomic layer deposited Al-doped ZnO thin films with various Al concentrations and deposition temperatures

4. Intrinsic ZnO f ilms fabricated by DC sputtering from oxygen-def icient targets for Cu(In,Ga)Se2 solar cell application

5. Fabrication of wide-gap Cu(In1−xGax)Se2 thin film solar cells: a study on the correlation of cell performance with highly resistive i-ZnO layer thickness

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low temperature (002)-oriented zinc oxide films prepared using ozone-based spatial atomic layer deposition;Ceramics International;2024-08

2. Effect of different oxygen precursors on alumina deposited using a spatial atomic layer deposition system for thin-film encapsulation of perovskite solar cells;Nanotechnology;2023-12-15

3. Introducing a Robust Flexible Conductive Hybrid: Indium Oxide-ParyleneC Obtained by Vapor Phase Infiltration;Chemistry of Materials;2023-09-18

4. Synthesis of Synergistic Ni(OH) ₂ @ZnO Core–Shell Nanostructured Electrodes by a Hydrothermal Method and Atomic Layer Deposition for High‐Performance Supercapacitors;Energy Technology;2023-01-11

5. Entropy‐Driven Self‐Healing of Metal Oxides Assisted by Polymer–Inorganic Hybrid Materials;Advanced Materials;2022-06-20

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3