Cross-Sectional Transmission Electron Microscopy For Polycrystalline Silicon Films
Author:
Publisher
Wiley
Subject
Histology,Pathology and Forensic Medicine
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1365-2818.1980.tb00251.x/fullpdf
Reference7 articles.
1. Microstructural analysis of evaporated and pyrolytic silicon thin films;Anderson;J. Electrochem. Soc.,1973
2. Investigation of polycrystalline silicon layers by electron microscopy and X-ray diffraction;Horiuchi;Solid State Electron.,1975
3. Chemically vapor deposited polycrystalline silicon-films;Kamins;IEEE Transactions on Parts, Hybrids and Packaging,1974
4. Dotiertes polykristallines Silizium in der CMOS-Technik;Müller;Bosch Techn. Berichte,1975
5. Structures of Si films, chemically vapor deposited on amorphous SiO2 substrates;Nagasima;Jap. J. appl. Phys.,1975
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Microstructure and Interfaces of Polysilicon in Integrated Circuits;Springer Proceedings in Physics;1989
2. Modulated optical reflectance: A method for characterizing polycrystalline silicon;Applied Physics Letters;1988-08-15
3. Analysis of polycrystalline silicon diffusion sources by secondary ion mass spectrometry;Journal of Applied Physics;1985-12
4. Low resistance polycrystalline silicon by boron or arsenic implantation and thermal crystallization of amorphously deposited films;Journal of Applied Physics;1984-08-15
5. Monte Carlo treatment of impurity diffusion in polycrystalline films;Journal of Applied Physics;1984-08-15
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