Effects of Ho and Ti Doping on Structural and Electrical Properties of BiFeO3 Thin Films-Reference-Cited by-同舟云学术

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Effects of Ho and Ti Doping on Structural and Electrical Properties of BiFeO3 Thin Films

Published:2013-11-28 Issue:1 Volume:97 Page:235-240
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:J. Am. Ceram. Soc.

Author:

Raghavan Chinnambedu Murugesan¹,Kim Jin Won¹,Kim Sang Su¹

Affiliation:

1. Department of Physics; Changwon National University; Changwon Gyeongnam 641-773 Korea

Funder

Ministry of Education, Science and Technology

National Research Foundation of Korea

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1111/jace.12641/fullpdf

Reference40 articles.

1. Mössbauer Effect in Ferroelectric-Antiferromagnetic BiFeO3;Bhide;Sol. Stat. Commun.,1965

2. Multiferroic and Magneto-Electric Materials;Eerenstein;Nature,2006

3. Physics and Applications of Bismuth Ferrite;Catalan;Adv. Mater.,2009

4. Electrical Control of Antiferromagnetic Domains in Multiferroic BiFeO3 Films at Room Temperature;Zhao;Nat. Mater.,2006

5. Structural and Multiferroic Properties of BiFeO3 Thin Films at Room Temperature;Yun;J. Appl. Phys.,2004

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2. Effects of Various Substrates on the Structure and Properties of BiFe0.91Zr0.09O3 Thin Films;Journal of Electronic Materials;2024-08-22

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4. Process-Controlled Domain Switching and Improved Ferroelectric Properties in Lanthanum-Modified Lead Zirconate Titanate Films;Journal of Materials Engineering and Performance;2023-04-13

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