Relationship between surface μ‐roughness and interface slurry particle spatial distribution during glass polishing
Author:
Affiliation:
1. Lawrence Livermore National Laboratory Livermore California
Funder
U.S. Department of Energy
Publisher
Wiley
Subject
Materials Chemistry,Ceramics and Composites
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1111/jace.14820
Reference20 articles.
1. Large Optics for the National Ignition Facility
2. Toward Deterministic Material Removal and Surface Figure During Fused Silica Pad Polishing
3. Convergent Pad Polishing of Amorphous Silica
4. Influence of Temperature and Material Deposit on Material Removal Uniformity during Optical Pad Polishing
Cited by 21 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Modeling of surface microtopography evolution in chemical mechanical polishing considering chemical-mechanical synergy;Tribology International;2025-01
2. Surface microtopography evolution of monocrystalline silicon in chemical mechanical polishing;Journal of Materials Processing Technology;2024-07
3. Improving monocrystalline silicon surface quality with chemical mechanical polishing using the slurry with the additive of isopropanol;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2024-06
4. Automated CMP multi-slurry ratio tuning for Defect Reduction : APC : Advanced Process Control;2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2023-05-01
5. Surface Morphology Evolution during Chemical Mechanical Polishing Based on Microscale Material Removal Modeling for Monocrystalline Silicon;Materials;2022-08-17
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3