Fused silica with sub‐angstrom roughness and minimal surface defects polished by ultrafine nano‐CeO <sub>2</sub>-Reference-Cited by-同舟云学术

Fused silica with sub‐angstrom roughness and minimal surface defects polished by ultrafine nano‐CeO ₂

Published:2022-11-24 Issue:3 Volume:106 Page:1766-1777
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:J Am Ceram Soc.

Author:

Wu Zehua¹²,Zhang Zhixin³,Jia Yong¹,Teng Fei¹,Li Gang¹^ORCID,Wang Feng³,Jin Yuqi¹

Affiliation:

1. CAS Key Laboratory of Chemical Lasers Dalian Institute of Chemical Physics Chinese Academy of Sciences Dalian China

2. University of Chinese Academy of Sciences Beijing China

3. State Key Laboratory of Catalysis Dalian National Laboratory for Clean Energy Dalian Institute of Chemical Physics Chinese Academy of Sciences Dalian China

Funder

National Natural Science Foundation of China

Dalian Science and Technology Innovation Fund

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1111/jace.18884

Reference53 articles.

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2. Surface roughness of optical quartz substrate by chemical mechanical polishing

3. Correlation Among Particle Size Distribution, Subsurface Damages Distribution and Surface Roughness in Optical Polishing Process

4. Effect of surface hydroxylation on ultra-precision machining of quartz glass

5. CampbellJH Hawley‐FedderRA StolzCJ MenapaceJA BordenMR WhitmanPK et al. In:NIF Optical Materials and Fabrication Technologies: An overview Proceedings of SPIE. p.84.

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