X-Ray Photoelectron Spectroscopy Study on the Interaction of Yttrium-Aluminum Oxide with Fluorine-Based Plasma
Author:
Publisher
Wiley
Subject
Materials Chemistry,Ceramics and Composites
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1551-2916.2011.04589.x/fullpdf
Reference23 articles.
1. Y. Kobayashi “Current Status and Needs in the Future of Ceramics Used for Semiconductor Production Equipment” Proceeding of the 37th Seminar on High-Temperature
2. Reduction of Particle Contamination in Plasma-Etching Equipment by Dehydration of Chamber Wall;Ito;Jpn. J. Appl. Phys., Part I,2008
3. Influence of Reactor Wall Conditions on Etch Processes in Inductively Coupled Fluorocarbon Plasmas;Schaepkens;J. Vac. Sci. Technol. A,1998
4. Fundamentals of Semiconductor Manufacturing and Process Control
5. Plasma-Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process;Iwasawa;J. Am. Ceram. Soc.,2007
Cited by 56 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of YF3 on fluorocarbon plasma resistance of Y2O3–Al2O3–B2O3 glasses;Ceramics International;2024-09
2. The Etching Behaviour and Fluorine-Based-Plasma Resistance of YOF Coatings Deposited by Atmospheric Plasma Spraying;Coatings;2024-08-26
3. Effect of O2/Ar ratio on the microstructure and tribological properties of Y2O3 films by multi-arc ion plating;Ceramics International;2024-08
4. Correlative characterization of plasma etching resistance of various aluminum garnets;Journal of the American Ceramic Society;2024-06-16
5. Optimization of a TEOS addition on plasma resistance of YAG ceramics;International Journal of Applied Ceramic Technology;2024-05-22
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3