Amorphous Titanium Carbide Films Produced by Low-Temperature Organometallic CVD
Author:
Publisher
Wiley
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1551-2916.1987.tb00091.x/fullpdf
Reference28 articles.
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2. Thermal and Mechanical Properties of Vapour-Deposited TiC Coatings for the First Wall of a Fusion Reactor;Okada;Thin Solid Films,1984
3. Effect of a Titanium Carbide Barrier Coating on the Reaction Between the Components of a Carbon Aluminum Composite Material;Zabolotskii;Sov. Powder Metall. Met. Ceram.,1982
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1. Chemical Vapor Deposition of Metal-Containing Thin-Film Materials from Organometallic Compounds;Progress in Inorganic Chemistry;2007-03-09
2. Titanocene dichloride used as a precursor for the chemical vapor deposition of titanium carbide: influence of gas phase transport;Surface and Coatings Technology;1996-04
3. Photochemical vapor deposition of mixed-metal thin films from organometallic precursors containing heteronuclear metal-metal bonds;Materials Letters;1991-01
4. Preparation of TiC films by photochemical vapour deposition using a D2 lamp;Thin Solid Films;1990-04
5. Method for the preparation of protective coatings by low‐temperature metal–organic chemical vapor deposition (MOCVD);Review of Scientific Instruments;1988-07
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