Antera 3D capabilities for pore measurements
Author:
Affiliation:
1. Oriflame Research and Development; Bray Ireland
2. Oriflame Skin Research Institute; Oriflame Cosmetics AB; Stockholm Sweden
Funder
Oriflame Cosmetics
Publisher
Wiley
Subject
Dermatology
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/srt.12472/fullpdf
Reference25 articles.
1. The conundrum of skin pores in dermocosmetology;Uhoda;Dermatology,2005
2. A study on seasonal variation of skin parameters in Korean males;Song;Int J Cosmet Sci,2015
3. The Effects of sleep deprivation on the biophysical properties of facial skin;Kim;J Cosmet Dermatol Sci Appl,2017
4. The age dependent changes in skin condition in African Americans, Asian Indians, Caucasians;Hillebrand;East Asians & Latinos. IfSCC Mag,2001
5. Ethnic differences in the structural properties of facial skin;Sugiyama-Nakagiri;J Dermatol Sci,2009
Cited by 18 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Efficacy of SGPP2 Modulation-Mediated Materials in Ameliorating Facial Wrinkles and Pore Sagging;Current Issues in Molecular Biology;2024-08-20
2. A smartphone application for personalized facial aesthetic monitoring;Skin Research and Technology;2024-07
3. New Regenerative and Anti-Aging Medicine Approach Based on Single-Stranded Alpha-1 Collagen for Neo-Collagenesis Induction: Clinical and Instrumental Experience of a New Injective Polycomponent Formulation for Dermal Regeneration;Biomedicines;2024-04-20
4. The Safety and Efficacy of Macrofocused Ultrasound without Visualization on Enlarged Facial Pores among Thai Patients: A Pilot Study;Dermatologic Therapy;2023-10-31
5. Use of Artificial Intelligence in Skin Aging;OBM Geriatrics;2023-04-17
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3