ULE®Glass with Improved Thermal Properties for EUVL Masks and Projection Optics Substrates
Author:
Affiliation:
1. Specialty Materials Division; Corning Incorporated; Corning New York 14831
Publisher
Wiley
Subject
General Materials Science
Reference18 articles.
1. K. Hrdina B. Hanson P. Fenn R. Sabia Proceedings of SPIE 27th Annual Microlithography Symposium 2002
2. K. Hrdina D. Brewer S. Kenney 2nd International Workshop on EUV Lithography 2000
3. S. T. Gulati M. J. Edwards Proceedings of Advanced Materials for Optics andPrecision Structures 1997
4. High Precision Photoelastic and Ultrasonic Techniques for Determining Absolute and Differential Thermal Expansion of Titania-Silica Glasses;Hagy;Appl. Opt.,1973
5. Determining Absolute Thermal Expansion of Titania-Silica Glasses: A Refined Ultrasonic Method;Hagy;Appl. Opt.,1975
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