Self‐defending mechanism of C/TaC‒SiC composites under 2100°C cyclic ablation environment

Author:

Tong Mingde12ORCID,Shi Xinhao1,Feng Tao1ORCID,Dai Ying2,He Pengfei2

Affiliation:

1. State Key Laboratory of Clean and Efficient Turbomachinery Power Equipment School of Mechanics Civil Engineering & Architecture Northwestern Polytechnical University Xi'an China

2. School of Aerospace Engineering and Applied Mechanics Tongji University Shanghai China

Abstract

AbstractTo achieve the repeatability of aerospace thermal components, C/TaC‒SiC composites were fabricated. Cycle ablation and bending tests were carried out. After 3 × 60 s of ablation beyond 2100°C, the mechanical property retention rate was 80.9%. Interestingly, a reaction similar to “ouroboros ring,” in which the cyclic reactions of “TaC being oxidized to Ta2O5 and Ta2O5 being reduced to TaC,” occurred in the central ablation region of C/TaC‒SiC composites. On the one hand, the continuous generation of TaC could prevent liquid state Ta2O5 from being blown off central ablation region, playing a similar role in “water and soil conservation.” On the other hand, liquid Ta2O5 covered the surface of C/TaC‒SiC composites during ablation process, contributing to block the inward permeation of oxidized gases. In addition, novel “Grotto” structures were detected in the transitional ablation region of C/TaC‒SiC composites. The formation reason of the “Grotto” structure has also been discussed.

Funder

National Natural Science Foundation of China

China Postdoctoral Science Foundation

National Science and Technology Major Project

Publisher

Wiley

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3