Growth of AlN Crystals on SiC Substrates by Thermal Nitridation of Al2 O3
Author:
Affiliation:
1. Institute of Multidisciplinary Research for Advanced Materials; Tohoku University; 2-1-1 Katahira Aoba-ku Sendai 980-8577 Japan
2. Department of Electrical and Electronic Engineering; Mie University; 1577 Kurima-machiya Tsu Mie 514-8507 Japan
Funder
Cabinet Office, Government of Japan
Publisher
Wiley
Subject
Materials Chemistry,Ceramics and Composites
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/jace.13183/fullpdf
Reference19 articles.
1. Properties of the State of the Art of Bulk III-V Nitride Substrates and Homoepitaxial Layers;Jaime;J. Phys. D: Appl. Phys.,2010
2. Study of In-Plane Orientation of Epitaxial AlN Films Grown on (111) SrTiO3;Yao;Appl. Phys. Lett.,2008
3. High Quality AlN Grown on SiC by Metal Organic Chemical Vapor Deposition;Chen;Appl. Phys. Lett.,2008
4. Investigation of AlN Films Grown by Molecular Beam Epitaxy on Vicinal Si(111) as Templates for GaN Quantum Dots;Benaissa;Appl. Phys. Lett.,2006
5. AlN Single Crystals;Slack;J. Cryst. Growth,1977
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Conditions for growth of AlN single crystals in Al-Sn flux;Journal of the American Ceramic Society;2018-06-19
2. Growth mechanism of AlN crystals via thermal nitridation of sintered Al2O3–ZrO2 plates;Ceramics International;2016-03
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