Preparation and Elastic Properties of rf-Sputtered Amorphous Films in the System SiO2-Y2O3
Author:
Publisher
Wiley
Subject
Materials Chemistry,Ceramics and Composites
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1151-2916.1995.tb08499.x/fullpdf
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3. Sinter and Sinter-HIP of Silicon Nitride Ceramics with Yttria and Alumina Additions;Iturriza;J. Mater. Sci.,1989
4. Effect of Crystallizing the Grain-Boundary Glass Phase on the High-Temperature Strength of Hot-Pressed Si3N4 Containing Y2O3;Tsuge;J. Am. Ceram. Soc.,1975
5. Microstructure of Y2O3 Fluxed Hot-Pressed Silicon Nitride;Clarke;J. Am. Ceram. Soc.,1978
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1. Recent progress on synthesis, multi-scale structure, and properties of Y–Si–O oxides;International Materials Reviews;2014-07
2. Physical Properties and Structure of rf-Sputtered Amorphous Films in the System Al2O3-Y2O3;Journal of the American Ceramic Society;2004-12-20
3. Synthesis of sinteractive single-phase microstructure yttrium disilicate precursor powder using hydrothermal processing;Journal of Materials Research;1998-11
4. In Situ Characterization of the Shrinkage Behavior of Ceramic Powder Compacts during Sintering by Using Heating Microscopy;Materials Characterization;1998-10
5. Coordination of yttrium in rf-sputtered amorphous films in the system SiO2–Y2O3;Journal of Non-Crystalline Solids;1997-12
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