Influence of Alumina Reaction Tube Impurities on the Oxidation of Chemically-Vapor-Deposited Silicon Carbide
Author:
Publisher
Wiley
Subject
Materials Chemistry,Ceramics and Composites
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1151-2916.1995.tb08449.x/fullpdf
Reference12 articles.
1. Kinetics of Crystallization of Stoichiometric SiO2 Glass in H2O Atmospheres
2. Oxidation of Chemically-Vapor-Deposited Silicon Nitride and Slnglem-Crystal Silicon
3. A Comparison of the Oxidation Kinetics of SiC and Si3 N 4
4. Oxidation Kinetics of Chemically Vapor-Deposited Silicon Carbide in Wet Oxygen
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