Role of routine investigations post cardiac devices implants in detecting peri‐procedural complications: A retrospective analysis from a tertiary UK center

Abstract

AbstractBackgroundPeri‐procedural complications associated with cardiac implantable electronic devices are not uncommon. European Society of Cardiology guidelines recommend device checks of all devices within 72 h of implant. European Heart Rhythm Association expert practical guide on Cardiac implantable electronic devices (CIEDs) recommend that a chest x‐ray (CXR) should be performed within 24 h to rule out pneumothorax and document lead positions. First, the rate of peri‐procedural complications associated with CIED implants at our center, as well as patient and/or procedural‐related factors that are associated with higher rates of complications, is analyzed. Second, the yield of the guideline‐recommended measures in the early detection of peri‐procedural complications is examined.Materials and methodsConsecutive de novo transvenous device implants at our center in 2019 were retrospectively analyzed. Patients’ demographics, types and indications for device therapy, procedural reports, device checks, and CXRs were obtained from the hospital electronic records.ResultsA total of 578 patients (Age 74 ± 16 years, 68% male) were included. All patients had routine post‐procedure CXRs and device checks. There were 16 (2.8%) complications; 7 (1.2%) pneumothoraxes, 6 (1%) pericardial effusions, and 3 (0.5%) lead displacements. Procedure time correlated significantly with complications; in uncomplicated cases it was 99 ± 43 min versus 127 ± 50 min in procedures associated with complications (p = .02).ConclusionsRoutine post CIED implantation CXRs can detect early peri‐procedural complications, while repeat post mobilization device checks has low yield of detection of complications. The only statistically significant predictor of peri‐procedural complications is the duration of the procedure; longer procedures were associated with higher rates of complications.