Interaction of Weakly Ionized Highly Dissociated Hydrogen Plasma with Solid Surfacesa
Author:
Publisher
Wiley
Subject
History and Philosophy of Science,General Biochemistry, Genetics and Molecular Biology,General Neuroscience
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1749-6632.1999.tb08780.x/fullpdf
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4. Low temperature epitaxial silicon film growth using high vacuum electron‐cyclotron‐resonance plasma deposition
5. 5Montgomery, J. S., J. P. Barnak, C. Silvestre, J. R. Hauser & J. R. Nemanich. 1995.InUltraclean semiconductor processing technology and surface chemical cleaning and pasivation. M. Liehr, M. Heyns and M. Hirose, Ed. 279 - 286. Mater. Sci. Soc., Pittsburg.
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