High-Throughput Characterization of Thin Film Shape Memory Alloys
Author:
Affiliation:
1. Tokyo Institute of Technology
2. Tokyo Electron Ltd.
3. Nagoya University
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering,Mechanical Engineering
Link
https://www.jstage.jst.go.jp/article/ieejsmas/133/8/133_348/_pdf
Reference14 articles.
1. (1) K. Otsuka, and C. M. Wayman : Shape memory materials, Cambridge Univ. Press (1999)
2. (2) S. Miyazaki, Y. Q. Fu, and W. M. Huang : Thin Film Shape Memory Alloys Fundamentals and Device Applications, Cambridge Univ. Press: Cambridge (2009)
3. (3) O. O. Famodu, J. Hattrick-Simpers, M. Aronova, K. S. Chang, M. Murakami, M. Wuttig, T. Okazaki, Y. Furuya, L. A. Knauss, and L. A. Bendersky : “Combinatorial investigation of ferromagnetic shape-memory alloys in the Ni-Mn-Al ternary system using a composition spread technique”, Mater. Trans., Vol. 45, pp. 173-177 (2004)
4. (4) N. Okada, Y. Fujii, Y. Ishikawa, M. Onoda, H. Y. Kim, and S. Miyazaki : “Effect of Zr content on shape memory characteristics and workability of Ti-Ni-Zr alloy”, J. Jpn. Inst. Metals, Vol. 72, pp. 152-157 (2008)
5. (5) R. Zarnetta, A. Savan, S. Thienhaus, and A. Ludwig : “Combinatorial study of phase transformation characteristics of a Ti-Ni-Pd shape memory thin film composition spread in view of microactuator applications”, Appl. Surf. Sci., Vol. 254, pp. 743-748 (2007)
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