Affiliation:
1. Tokyo Metropolitan University
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering,Mechanical Engineering
Reference17 articles.
1. (1) K. Goto and J. Taniguchi : “Fabrication of Complex 3D Nanoimprint Mold by Using Acceleration Voltage Electron Beam Lithography”, J. Photopolym. Sci. Technol., Vol. 31, No. 2, pp. 271-276 (2018)
2. (2) X. Lin, X. Dou, X. Wang, and R. T. Chen : “Nickel Electroplating for Nanostructure Mold Fabrication”, J. Nanosci. Nanotechnol., Vol. 11, No. 8, pp. 7006-7010 (2011)
3. (3) Y. Ishii and J. Taniguchi : “Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography”, Microelectronic Engineering, Vol. 84, pp. 912-915 (2007)
4. (4) S. Barcelo and Z. Li : “Nanoimprint lithography for nanodevice fabrication”, Barcelo and Li Nano Convergence, Vol. 3, No. 21, pp. 1-9 (2016)
5. (5) D. K. Oh, T. Lee, B. Ko, T. Badloe, J. G. Ok, and J. Rho : “Nanoimprint lithography for high-throughput fabrication of metasurfaces”, Front. Optoelectron., pp. 1-23 (2021)