反応性スパッタリング法による光導波路用SiCO薄膜における膜特性のガス圧依存性-Reference-Cited by-同舟云学术

反応性スパッタリング法による光導波路用SiCO薄膜における膜特性のガス圧依存性

Published:2023-10-01 Issue:10 Volume:143 Page:326-330
ISSN:1341-8939
Container-title:IEEJ Transactions on Sensors and Micromachines
language:en
Short-container-title:IEEJ Trans. SM

Author:

Nikkuni Hiroyuki¹,Ito Hiroshi¹,Takatsuka Yu²

Affiliation:

1. National Institute of Technology, Tokyo College

2. Nagaoka University of Technology

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Link

https://www.jstage.jst.go.jp/article/ieejsmas/143/10/143_326/_pdf

Reference8 articles.

1. (1) H. Nikkuni and M. Ohkawa : “Design guidelines for a guided-wave optical pressure sensor based on dependences of sensitivity and resonance frequency on diaphragm dimensions”, Opt. Eng., Vol. 56, No. 5, p. 057108 (2017)

2. (2) G. Pandraud, H. T. M. Pham, P. J. French, and P. M. Sarro : “Polarization-insensitive PECVD SiC waveguides for sensor platform”, Opt. Mater., Vol. 28, pp. 380-384 (2006)

3. (3) N. Ichikawa, H. Hoshi, H. Nikkuni, and H. Ito : ”Research on Transparency Improvement of SiC Thin Film for Optical Waveguide”, IEICE Society Conf. 2015, C-3-28 (2015) (in Japanese)

4. 市川直弥・星隼人・新國広幸・伊藤浩：「光導波路用のSiC薄膜における透明性の向上についての研究」, 2015年信学会エレクトロニクスソサイエティ大会, C-3-28 (2015)

5. (4) H. Nikkuni, C. Numata, R. Yamaji, H. Ito, and Y. Kawamata : “Transparency Improvement of SiCO Thin Film for Optical Waveguide with Reactive Sputtering Method”, IEEJ Trans. SM, Vol. 140, No. 12, pp. 369-373 (2020) (in Japanese)