Micro Connector for High Packaging Density Fabricated by Using UV Thick Photoresist

Author:

Unno Toshinori1,Toriyama Toshiyuki2,Bhuiyan Moinul Islam1,Yokoyama Yoshihiko1,Sugiyama Susumu1

Affiliation:

1. Ritsumeikan University

2. New Energy and Industrial Technology Development Organization

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Development and Optimization of a Low Normal Force Contact;Advanced Materials Research;2014-05

2. Inelastic Constitutive Relationship of Electroplated Nickel Films at Elevated Temperatures for Design of Micro Connector;IEEJ Transactions on Sensors and Micromachines;2005

3. 10.4139/sfj.55.226;Journal of The Surface Finishing Society of Japan;2004

4. 10.4139/sfj.55.254;Journal of The Surface Finishing Society of Japan;2004

5. Thick Resist Pattern Replication Using Low Numerical-Aperture Projection Lithography and It's Application to Fabrication of Micro Components;Journal of the Japan Society for Precision Engineering, Contributed Papers;2004

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