Control of Magnetic Field for Sustainment of Ion Production and Uniform Ion Flux to Substrate in Neutral Loop Discharge Plasma-Reference-Cited by-同舟云学术

Control of Magnetic Field for Sustainment of Ion Production and Uniform Ion Flux to Substrate in Neutral Loop Discharge Plasma

Published:2012 Issue:4 Volume:132 Page:278-283
ISSN:0385-4205
Container-title:IEEJ Transactions on Fundamentals and Materials
language:en
Short-container-title:IEEJ Trans. FM

Author:

Yoshida Takuhei¹,Sakurai Yohei¹,Sugawara Hirotake¹,Murayama Akihiro¹

Affiliation:

1. Division of Electronics for Informatics, Graduate School of Information Science and Technology, Hokkaido University

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering

Link

https://www.jstage.jst.go.jp/article/ieejfms/132/4/132_4_278/_pdf

Reference13 articles.

1. Application of Radio-Frequency Discharged Plasma Produced in Closed Magnetic Neutral Line for Plasma Processing

2. (2) T. Uchida and S. Hamaguchi : “Magnetic neutral loop Discharge (NLD) plasmas for surface processing”, J. Phys. D: Appl. Phys., Vol. 41, 083001, pp. 1-21 (2008)

3. Usefulness of Magnetic Neutral Loop Discharge Plasma in Plasma Processing

4. Very uniform and high aspect ratio anisotropy SiO2 etching process in magnetic neutral loop discharge plasma

5. (5) H. Sugawara, T. Osaga, H. Tsuboi, K. Kuwahara, and S. Ogata : “Numerical simulation of electron transport in electric and magnetic fields for analysis of electron temperature and number density profiles measured in an argon magnetic neutral loop discharge plasma”, Japan J. Appl. Phys., Vol. 49, 086001, pp. 1-5 (2010)

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