Leading-Edge Technology and Trend in Light Application and Visual Science
Author:
Affiliation:
1. Tokyo Institute of Technology
2. Osaka Prefecture University
3. Tokyo Denki University
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering
Link
http://www.jstage.jst.go.jp/article/ieejfms/130/1/130_1_29/_pdf
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1. Gold nanoparticle distribution monitor for drug delivery system based on optically assisted ultrasonic velocity-change imaging
2. PEG-modified gold nanorods with a stealth character for in vivo applications
3. (3) B. S. Seo, D. K. Kang, M. S. Noh, et al. : “Double Patterning addressing Imaging challenges for near and sub k1=0.25 node layout”, Proc. SPIE, 73791N-1-10 (2009)
4. (4) M. Dusa, B. Arnold, J. Finders, et al. : “The Lithography Technology for the 32 nm HP and Beyond”, Proc. SPIE, 702810-1-11 (2008)
5. (5) N. Nishimura, M. Kushibiki, and K. Yatsuda : “The demonstration of fine gate pattern fabrication towards 22-nm scale using double patterning method”, Digest of Papers, Microprocesses and Nanotechnology 2008, pp. 42-43 (2008)
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