Automatic Distance Controlling System between Sensor Tip and Sample under Test for Electrostatic Force Microscopy-Reference-Cited by-同舟云学术

Automatic Distance Controlling System between Sensor Tip and Sample under Test for Electrostatic Force Microscopy

Published:2021-06-01 Issue:6 Volume:141 Page:373-378
ISSN:0385-4205
Container-title:IEEJ Transactions on Fundamentals and Materials
language:en
Short-container-title:IEEJ Trans. FM

Author:

Nishiguchi Yoshikazu¹,Higashio Junpei²,Uehara Toshio³,Ashizawa Yoshito³,Nakagawa Katsuji³

Affiliation:

1. Graduate School of College of Science and Technology, Nihon University

2. General Bussan Co., LTD

3. College of Science and Technology, Nihon University

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering

Link

https://www.jstage.jst.go.jp/article/ieejfms/141/6/141_373/_pdf

Reference17 articles.

1. (1) K. Kobayashi : “Semiconductor Dopant Profiling by Electrostatic Force Detection with AFM”, KENBIKYO, Vol. 44, No. 3, pp. 165-169 (2009) (in Japanese)

2. 小林圭：「AFMによる静電気力測定に基づく半導体のドーパンド分布評価」, 顕微鏡, Vol. 44, No. 3, pp. 165-169 (2009)

3. (2) K. Nakagawa and T. Uehara : “Study for Impurity Doping Distribution in Semiconductor Applying Imaging of Surface Potential and Achieving Method for Higher Spatial Resolution”, J. Imaging Soc. Jpn, Vol. 56, No. 1, pp. 92-97 (2017) (in Japanese)

4. 中川活二・上原利夫：「表面電位画像化による半導体不純物分布評価および高空間分解能化」, 画像学誌, Vol. 56, No. 1, pp. 92-97 (2017)

5. (3) S. Terasaki T. Hasegawa, and K. Aizawa : “Organic Photoconductor Evaluation Technology: Latent Image Evaluation and Material Design”, Fuji Electric Journal, Vol. 85, No. 4, pp. 289-293 (2012) (in Japanese)