Application of Capillary Discharge Technique for Deposition of Diamond-Like Carbon Thin Films (2<sup>nd</sup> Report)-Reference-Cited by-同舟云学术

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Application of Capillary Discharge Technique for Deposition of Diamond-Like Carbon Thin Films (2^nd Report)

Published:2013 Issue:5 Volume:133 Page:293-299
ISSN:0385-4205
Container-title:IEEJ Transactions on Fundamentals and Materials
language:en
Short-container-title:IEEJ Trans. FM

Author:

Fujii Kiyotoshi¹,Fujiwara Etsuo¹,Shimizu Masayoshi²,Inoue Shozo¹

Affiliation:

1. Graduate School of Engineering, University of Hyogo

2. Shimizu Densetsu Kogyo Co., Ltd.

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering

Link

https://www.jstage.jst.go.jp/article/ieejfms/133/5/133_293/_pdf

Reference42 articles.

1. (2) K. Fujii, R. Yamamoto, E. Fujiwara, M. Shimizu, and S. Inoue : “Pulsed Plasma Deposition as a New Deposition Method for Diamond-Like Carbon Films”, ISSP2009 (The Tenth International Symposium on Sputtering and Plasma Processes), Proceedings, pp. 512-515 (2009)

2. (3) K. Fujii, R. Yamamoto, T. Namazu, E. Fujiwara, M. Shimizu, and S. Inoue : “Fabrication of Diamond-Like Carbon thin films by Pulsed Plasma Deposition technique”, Proc. of JSPE Semestrical Meeting, Vol. 2010F (2010) (in Japanese)

3. (4) G. Muller, M. Konijnenberg, G. Krafft, and C. Schultheiss : “Thin film deposition by means of pulsed electron beam ablation”, Sci. & Tech. Thin Film, Vol. 89, pp. 89-119 (1995)

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