Present Status and Research Plan of Saga Synchrotron Light Research Center-Reference-Cited by-同舟云学术

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Present Status and Research Plan of Saga Synchrotron Light Research Center

Published:2004 Issue:7 Volume:124 Page:1345-1351
ISSN:0385-4221
Container-title:IEEJ Transactions on Electronics, Information and Systems
language:en
Short-container-title:IEEJ Trans.EIS

Author:

Ogawa Hiroshi¹,Kamada Masao¹,Nishio Mitsuhiro²,Masuda Masataka¹,Guo Qixin²,Tanaka Tooru¹,Kondo Yuzi³,Hayashida Kazuki³,Motooka Teruaki⁴

Affiliation:

1. Synchrotron Light Application Center, Saga University

2. Dept. of Electrical & Electronic Engineering, Faculty of Science & Engineering, Saga University

3. Venture Business Laboratory, Saga University

4. Dept. of Materials Science & Engineering, Kyushu University

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering

Link

https://www.jstage.jst.go.jp/article/ieejeiss/124/7/124_7_1345/_pdf

Reference14 articles.

1. (7) H. Akazawa and Y. Utsumi : “Synchrotron Radiation Excited Epitaxy Using Disilane”, Hoshako, Vol. 8, No. 1, pp. 30-48 (1995-1) (in Japanese)

2. (8) Y. Sugita, Y. Nara, and T. Ito : “Photo-Stimulated Removal of the Chenical-Oxide on Si (100) and Its Application to the Gas-Source Homo-Epitaxy”, Hoshako, Vol. 8, No. 1, pp. 49-68 (1995-1) (in Japanese)

3. (9) H. Akazawa : “Photoepitaxy of Si and Ge by synchrotron radiation”, Appl. Surface Sci., Vol. 106, pp. 211-222 (1996)

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