Chemical Reaction Mechanisms of Oxide Layer Formation via Oxygen Molecule at Ni(001) Surface as Observed by Synchrotron Photoemission Spectroscopy
Author:
Affiliation:
1. National Institutes for Quantum and Radiological Science and Technology
2. University of Hyogo
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering
Link
https://www.jstage.jst.go.jp/article/ieejeiss/137/3/137_394/_pdf
Reference14 articles.
1. (1) P. H. Holloway and J. B. Hudson : “Kinetics of the Reaction of Oxygen with Clean Nickel Single Crystal Surfaces I. Ni(100) surfaces”, Surface Science, Vol. 43, pp. 123-140 (1974)
2. (2) P. H. Holloway and J. B. Hudson : “Kinetics of the Reaction of Oxygen with Clean Nickel Single Crystal Surfaces II. Ni(111) surfaces”, Surface Science, Vol. 43, pp. 141-149 (1974)
3. (3) P. H. Holloway : “Chemisorption and Oxide Formation on Metals : Oxygen-nickel reaction”, J. Vac. Sci. Technol., Vol. 18, No. 2, pp. 653-659 (1981)
4. (4) P. R. Norton, R. L. Tapping, and J. W. Goodale : “A Photoemission Study of the Interaction of Ni(100), (110), and (111) Surfaces with Oxygen”, Surfacce Science, Vol. 65, pp. 12-36 (1977)
5. (5) J. T. Stuckless, C. E. Wartnaby, N. Al-Sarraf, St. J. B. Dixon-Warren, M. Kovar, and D. A. King : “Oxygen Chemisorption and Oxide Film Growth on Ni(100), (110), and (111) : Sticking Probabilities and Microcalorimetric Adsorption Heats”, J. Chem. Phys., Vol. 106, pp. 2012-2030 (1997)
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