Transparent Conducting ZnO Thin Films Prepared at Room Temperature by PLD Method
Author:
Affiliation:
1. Department of Electronics, Information and Communication Engineering, Osaka Sangyo University
2. Okuda Technical Office
3. Hitachi High-Technologies Corporation
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering
Link
https://www.jstage.jst.go.jp/article/ieejeiss/126/11/126_11_1268/_pdf
Reference36 articles.
1. (1) A. Suzuki, T. Matsushita, T. Aoki, Y. Yoneyama, and M. Okuda : “Micro-Textured Milky ZnO:Ga Thin Films Fabricated by Pulsed Laser Deposition Using Second-Harmonic-Generation of Nd:YAG Laser”, Jpn. J. Appl. Phys., Vol. 38, No. 1, L71-L73 (1999-1)
2. (2) A. Suzuki, T. Matsushita, T. Aoki, Y. Yoneyama, and M. Okuda : “Pulsed Laser Deposition of Transparent Conducting Indium Tin Oxide Films in Magnetic Field Perpendicular to plume”, Jpn. J. Appl. Phys., Vol. 40, No. 4, L401-L403 (2001-4)
3. (3) H. Izumi, F. O. Adurodija, T. Kaneyoshi, T. Ishihara, H. Yoshioka, and M. Motoyama : “Electrical and structural properties of indium tin oxide films prepared by pulsed laser deposition”, J. Appl. Phys., Vol. 91, Issue 3. pp. 1213∼1218 (2002-3)
4. (4) A. Suzuki, T. Matsushita, T. Aoki, A. Mori, and M. Okuda : “Highly conducting transparent indium tin oxide films prepared by pulsed laser deposition”, Thin Solid Films, Vol. 411, Issue 1, pp. 23-27 (2002-5)
5. (5) M. A. Morales-Paliza, R. F. Haglund, Jr., and L. C. Feldman : “Mechanisms of oxygen incorporation in indium-tin-oxide films deposited by laser ablation at room temperature”, Appl. Phys. Lett., Vol. 80, Issue 20. pp. 3757-3759 (2002-5)
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