Microfabrication of Poly(tetrafluoroethylene) Using SR Direct Etching
Author:
Affiliation:
1. Laboratory of Advanced Science & Technology for Industry University of Hyogo
2. Japan Society for the Promotion of Sience
3. Graduate School of Engineering, University of Hyogo
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering
Link
http://www.jstage.jst.go.jp/article/ieejeiss/129/2/129_2_244/_pdf
Reference6 articles.
1. (1) Y. Zhang, T. Katoh, M. Washio, H. Yamada, and S. Hamada : “High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation”, Appl. Phys. Lett. 67 (1995)
2. (2) Y. Utsumi, T. Kishimoto, T. Hattori, and H. Hara : “Large Area X-ray Lithography System for LIGA process Operating in Wide Energy Range of Synchrotron Radiation”, Jpn. J. Appl. Phys., Vol. 44, No. 7B, pp. 5500-5504 (2005)
3. (3) Y. Utsumi and T. Kishimoto : “Large Area and Wide Dimension Range X-ray Lithography for Lithographite, Galvanoformung, and Abformung Process using Energy Variable Synchrotron Radiation”, J. Vac. Sci. Technol. B(23) (2005)
4. (4) Y. Utsumi : “LIGA Process-Application to Microsystems and Outlook for The Future”, ISMM, 18 (2005)
5. Monte Carlo Simulation of Grain Boundary Cross Effect on Hydrogen Diffusivity in Aluminum
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