Low-energy electron-induced decarbonylation of Fe(CO)5 films adsorbed on Au(111) surfaces

Author:

Hauchard Christelle1,Rowntree Paul A.1

Affiliation:

1. Department of Chemistry, University of Guelph, Guelph, ON N1G 2W1, Canada.

Abstract

The decarbonylation of Fe(CO)5 adsorbed in monolayer and multilayer films on Au(111)/mica substrates has been induced by 0–20 eV electrons and studied by grazing incidence IR spectroscopy. Our results show that the cross sections for the initial stages of this process in as-deposited films range from 60–300 Å2 and show considerable variations with the incident electron energy. The high sensitivity to low-energy electrons is believed to be the result of secondary reactions of anion fragments in the film with the neighbouring Fe(CO)5 moieties, leading to increasingly massive heteronuclear Fen(CO)m species and progressive CO elimination. Continued exposure to the electron beam leads to the slower degradation of these newly created species into an Fe-rich deposit containing traces of CO. These traces are removed by subsequent heating to ~300 K. Fe(CO)5 films that have been subjected to temperatures exceeding 125 K have no measurable sensitivity to the electron beam in the 0–20 eV regime; this is believed to be due to the structural transformation of the as-deposited thin film structure into 3D aggregates. This structural motif presents a very limited quantity of the adsorbed Fe(CO)5 to the incident beam, and may also form a protective layer of the robust Fen(CO)m species during the initial stages of exposure to the electrons.

Publisher

Canadian Science Publishing

Subject

Organic Chemistry,General Chemistry,Catalysis

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3