A Kinetic Model of the Accommodation Pumping Phenomenon

Author:

Branton Graham Richard,Ryce Stephen Alan

Abstract

A simple kinetic model of the accommodation pumping phenomenon is developed. This model is consistent with the earlier suggestion that the extent to which specular reflection occurs from smooth Pyrex surfaces is dependent upon the velocity of the atoms. It is shown that the upper limit for the pump ratio (PA/PB) is 2, but that in any real situation this ratio would be less than this value. The model is used to show that the deviation of the thermal transpiration ratio from the ideal value, (T1/T2)1/2, should be the same as the accommodation pumping ratio for the same tubing with the same temperature difference.

Publisher

Canadian Science Publishing

Subject

Organic Chemistry,General Chemistry,Catalysis

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Thermal Transpiration Behavior of Hydrogen Isotopes in Cryogenic Pump System;Fusion Science and Technology;2009-07

2. Analysis of a micromachine based vacuum pump on a chip actuated by the thermal transpiration effect;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999

3. Erratum: A Kinetic Model of the Accommodation Pumping Phenomenon;Canadian Journal of Chemistry;1974-10-15

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