Author:
Bell T. N.,Soto-Garrido G.,Sherwood A. G.
Abstract
The decomposition of NO, photosensitized by Hg63P atoms, leads to N2 and N2O. The decomposition rate is enhanced by the silanes Me2SiF2 and MeSiF3. A mechanism is proposed involving the formation of complexes of the silanes with electronically-excited NO.
Publisher
Canadian Science Publishing
Subject
Organic Chemistry,General Chemistry,Catalysis
Cited by
4 articles.
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