Development of “Punching-Out Target” to Generate Extreme Ultraviolet (EUV) Light-Reference-Cited by-同舟云学术

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Development of “Punching-Out Target” to Generate Extreme Ultraviolet (EUV) Light

Published:2007-05 Issue:4 Volume:51 Page:769-771
ISSN:1536-1055
Container-title:Fusion Science and Technology
language:en
Short-container-title:Fusion Science and Technology

Author:

Yasuda Yuzuri¹,Nagai Keiji¹,Norimatsu Takayoshi¹,Fujioka Shinsuke¹,Nishimura Hiroaki¹,Nishihara Katsunobu¹,Izawa Yasukazu¹,Mima Kunioki¹

Affiliation:

1. Institute of Laser Engineering, Osaka University, 2-6 Yamada-oka Suita, Osaka 565-0871, Japan

Publisher

Informa UK Limited

Subject

Mechanical Engineering,General Materials Science,Nuclear Energy and Engineering,Nuclear and High Energy Physics,Civil and Structural Engineering

Link

https://www.tandfonline.com/doi/pdf/10.13182/FST07-A1476

Reference13 articles.

1. EUV Sources for Lithography

2. Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams

3. Dynamics of Mass-Limited Laser Plasma Targets as Sources for Extreme Ultraviolet Lithography

4. Monochromatic imaging and angular distribution measurements of extreme ultraviolet light from laser-produced Sn and SnO2 plasmas

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Oriented and low-density tin dioxide film by sol-gel mineralizing tin-contained hydroxypropyl cellulose lyotropic liquid crystal for laser-induced extreme ultraviolet emission;Journal of Polymer Science Part A: Polymer Chemistry;2009-08-04

2. Nano-structured lithium-tin plane fabrication for laser produced plasma and extreme ultraviolet generation;Laser and Particle Beams;2008-08-08

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