Helium-Charged La-Ni-Al Thin Films Deposited by Magnetron Sputtering-Reference-Cited by-同舟云学术

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Helium-Charged La-Ni-Al Thin Films Deposited by Magnetron Sputtering

Published:2005-08 Issue:1 Volume:48 Page:534-538
ISSN:1536-1055
Container-title:Fusion Science and Technology
language:en
Short-container-title:Fusion Science and Technology

Author:

Shi Liqun¹,Chen Deming²,Xu Shilin¹,Liu Chaozhu¹,Hao Wanli³,Zhou Zhuyin¹

Affiliation:

1. Applied Ion Beam Physics Laboratory, Fudan University, Shanghai, 200433, China

2. Institute of Metal Research, The Chinese Academy of Sciences, Shengyang 110016, China

3. Institue of Nulear and Chemistry, China Academy of Engerineering Physics, Chengdu 610003, China

Publisher

Informa UK Limited

Subject

Mechanical Engineering,General Materials Science,Nuclear Energy and Engineering,Nuclear and High Energy Physics,Civil and Structural Engineering

Link

https://www.tandfonline.com/doi/pdf/10.13182/FST05-A982

Reference8 articles.

1. Effects of radiolytic tritium decay on the thermodynamic behavior of LaNi4.25Al0.75 tritides

2. Helium dynamics in metal tritides II. The significance of microstructure in the observed helium behavior for LaNiAl tritides

3. Tritium aging effects in LaNi4.25Al0.75

4. Study of the discharge gas trapping during thin-film growth

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1. Synthesis and characterization of helium-charged titanium hydride films deposited by direct current magnetron sputtering with mixed gas;Materials & Design;2017-04

2. Thermal desorption behaviors of helium in Zr-Co films prepared by sputtering deposition method;Vacuum;2016-08

3. Behavior of He in Zr-Co Films;ACTA PHYS-CHIM SIN;2015

4. Theoretical Study on the Structure and Properties of Helium-Containing Zirconium Hydrides;Fusion Science and Technology;2014-05

5. First-principles calculations on the crystal and electronic structures of LaNi4.5Al0.5H6−xHex (, 0.5 and 1);Solid State Communications;2008-08

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