Universal Surface Hydrophilicity Obtained by Using Low-temperature Plasma H2O gas for Nanosphere Lithography-Reference-Cited by-同舟云学术

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Universal Surface Hydrophilicity Obtained by Using Low-temperature Plasma H2O gas for Nanosphere Lithography

Published:2011-01-14 Issue:1 Volume:58 Page:1-4
ISSN:0374-4884
Container-title:Journal of the Korean Physical Society
language:en
Short-container-title:J. Korean Phy. Soc.

Author:

Yeo Jong-Bin,Kim Nam-Hoon,Lee Hyun-Yong

Publisher

Korean Physical Society

Subject

General Physics and Astronomy

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Cold plasma synthesis of phosphorus-doped CoFe₂O₄ with oxygen vacancies for enhanced OER activity;Physical Chemistry Chemical Physics;2023

2. The temporal and spatial variability of the Yellow Sea Cold Water Mass in the southeastern Yellow Sea, 2009–2011;Acta Oceanologica Sinica;2013-09

3. Dynamic scaling behaviors of the discrete growth models on fractal substrates;Journal of Statistical Mechanics: Theory and Experiment;2012-10-17

4. Uni-, Bi-, and Tri-Directional Wetting Caused by Nanostructures with Anisotropic Surface Energies;Langmuir;2012-07-16

5. Realization of multi-paired photonic crystals by the multiple-exposure nanosphere lithography process;Scripta Materialia;2012-03

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