Characterization of a Ru-based ternary-oxide thin film for a diffusion barrier-Reference-Cited by-同舟云学术

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Characterization of a Ru-based ternary-oxide thin film for a diffusion barrier

Published:2012-09 Issue:6 Volume:61 Page:984-987
ISSN:0374-4884
Container-title:Journal of the Korean Physical Society
language:en
Short-container-title:Journal of the Korean Physical Society

Author:

Hong Tae Eun,Jeong E. D.,Byeon M. R.,Kang Y. B.,Yang Ho-Soon,Kim Soo-Hyun

Publisher

Korean Physical Society

Subject

General Physics and Astronomy

Link

http://link.springer.com/content/pdf/10.3938/jkps.61.984.pdf

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. Scalable control program for multiprecursor flow-type atomic layer deposition system;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2015-01

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