Nano-Mechanical Analyses of Low-Dielectric-Constant SiOC(-H) Thin Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
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Published:2008-11-15
Issue:9(5)
Volume:53
Page:2512-2517
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ISSN:0374-4884
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Container-title:Journal of the Korean Physical Society
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language:en
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Short-container-title:J. Korean Phy. Soc.
Author:
Jung AnSoo,Kim ChangYoung,Navamathavan R.,Woo Jong-Kwan,Lee Kwang-Man,Choi ChiKyu
Publisher
Korean Physical Society
Subject
General Physics and Astronomy