Reaction of Hydrochloric Acid with Filter Cake Created by Mn3O4 Water-Based Drilling Fluids

Author:

Al Moajil A. M.1,Nasr-El-Din H. A.1

Affiliation:

1. Texas A&M University

Abstract

Abstract Use of high HCl concentrations to dissolve Mn3O4-based filter cake will result in corrosive environment and release of poisonous chlorine gas (i.e., strong oxidizer). Thus, removal of deposits formed at the wellbore because of drilling fluids becomes more challenging when dealing with additives (e.g., Mn3O4) that involve complex interactions with the cleaning fluids, especially at high temperatures. We studied the reaction of HCl with Mn3O4 particles as a function of time. Additionally, we investigated the release of chlorine gas up to reaction temperature of 284°F and 15 wt% HCl. Several techniques and instruments were employed in this study. Solubility of filter cake was examined using a HPHT filter press. GC/MS technique was used for chlorine gas analysis, atomic absorption were used to measure manganese concentrations, and to analyze solids remained after reaction we used x-ray diffraction. Solubility of filter cake using 10 wt% HCl and temperature of 250°F was 78 wt% (no mixing during the reaction). At 190°F, high concentration of HCl (10 wt%) showed complete solubility of Mn3O4 particles while, 1 and 4 wt% HCl showed ∼70 wt% solubility. Chlorine gas was not dissociated using 4 wt% HCl at 190°F. At 284°F, 5 wt% HCl was enough to release chlorine gas. Therefore, HCl concentrations lower than 5 wt% are recommended and will dissolve most of Mn3O4. The following reaction agrees with the experimental results of 1 and 4 wt% HCl at 190°F: Mn3O4+4HCl⇌2MnCl2+MnO2+2H2O

Publisher

SPE

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3