Affiliation:
1. Belarusian State University
2. JSC “Integral” – “Integral” Holding Managing Company
Abstract
Herein, the temperature dependences of the static current gain (β) of bipolar n-p-n-transistors, formed by similar process flows (series A and B), in the temperature range 20–125 °С was investigated. The content of uncontrolled technological impurities in the A series devices was below the detection limit by the TXRF method (for Fe < 4.0 · 109 at/cm2). In series B devices, the entire surface of the wafers was covered with a layer of Fe with an average concentration of 3.4 ∙ 1011 at/cm2; Cl, K, Ca, Ti, Cr, Cu, Zn spots were also observed. It was found that in B series devices at an average collector current level (1.0 ∙ 10–6 < Ic <1.0 ∙ 10–3 A) the static current gain was greater than the corresponding value in A series devices. This was due to the higher efficiency of the emitter due to the high concentration of the main dopant. This circumstance also determined a stronger temperature dependence of β in series B devices due to a significant contribution to its value from the temperature change in the silicon band gap. At Ic < 1.0 ∙ 10–6 A β for B series devices became significantly less than the corresponding values for A series devices and practically ceases to depend on temperature. In series B devices, the recombination-generation current prevailed over the useful diffusion current of minority charge carriers in the base due to the presence of a high concentration of uncontrolled technological impurities. For A series devices at Ic < 10–6 A, the temperature dependence of β practically did not differ from the analogous dependence for the average injection level.
Publisher
Publishing House Belorusskaya Nauka
Subject
Computational Theory and Mathematics,General Physics and Astronomy,General Mathematics
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